Visa, K - PATENTS ® semiconductor industry with a refractometer PR - 33 - S
Suitable for semiconductor liquid chemical measurements
Flow pool using improved the refractometer compact shape, made of super pure PTFE is suitable for semiconductor liquid chemical measurements.By quarter to 1 inch pyrrha Pillar or flaring Flare connection.
Visa, K - PATENTS ® semiconductor industry with a refractometer PR - 33 - S for wafer chemical concentration monitoring in the clean room, is generally installed in mixing, cleaning, etching and (CMP) on the machine.
PR - 33 - S contains a ultrapure flow pool body and a modified PTFE Ethernet cable, different standard Ethernet switch power supply (PoE) are available through the Ethernet cable to the sensor power supply, and the data transmission to the computer.PR - 33 - S real-time monitoring, chemical concentration when the concentration of chemicals within the prescribed scope, feedback via Ethernet alarm immediately.Can be configured, for example, low concentration and high concentration of alarm to control and extending the service life of the solution.Here the concentration of the refractive index by means of solution nD and temperature measurement to determine.
PR - 33 - S directly through the horn or pillar accessories for installation.PR - 33 - S structure is compact, do not contain metal, small volume.
Key elements:
- N.I.S.T. under the standard of the traceability of calibration and verification, using standard refractive index liquid and validation procedures for validation.
- Optical core design.
- Through the Ethernet data record and remote interface.
- Standard UDP/IP communications.
- Process temperature range: - 20 ° C to 85 ° C (4 ° F to 185 ° F).
- Built-in Pt1000 rapid temperature measurement and automatic temperature compensation.
The main advantages
Fully digital equipment
Visa, K ‑ PATENTS ® semiconductor industry with a refractometer PR - 33 - S used for process monitoring, can provide continuous output signal of Ethernet, compact design, can be directly through the process piping.
Keep accurate and stable measurement under the full scale
ND refractive index measurement range 1.3200 1.5300, equal to 0-100% (weight percentage).For the high concentration of HF, nD 1.2600-1.4700 range of choice.Nominal accuracy of R.I. + 0.0002, usually the equivalent of 0.1% (by weight percentage), for example, the concentration of hydrochloric acid.
Measurement is not affected by particle, bubbles, turbulence and PPM level of concentration of trace impurities.
Easy to maintain
Optical core design.
No drift.The need to calibration.The need for mechanical adjustment.
The product documentation
Docs.vaisala.comCustomer case
case
Visa's many semiconductor manufacturing determination of the concentration of H2O2 in tungsten CMP grinding fluid instrument supplier
Visa, K ‑ PATENTS semiconductor industry with a refractometer designed for semiconductor manufacturing environment.The instrument size and do not contain metal, so suitable for chemicals in does not affect the process of measurement.